论文标题
2D半导体材料中的TRION聚类结构和结合能:Faddeev方程方法
Trion clustering structure and binding energy in 2D semiconductor materials: Faddeev equations approach
论文作者
论文摘要
在这项工作中,我们开发了基本的形式主义,以在动量空间中使用FADDEEV方程来研究半导体分层材料中的Trions,该方程在两个维度的三个不同粒子中。我们解决了短距离一项可分离的Yamaguchi电位和rytova-keldysh(RK)相互作用的TRION FADDEEV耦合的积分方程,并将其应用于MOS $ _2 $层。我们设计了两种不同的正则化方法,以克服在动量空间中Faddeev方程的数值解中排斥电子电子RK势的挑战。第一种方法调节红外区域的排斥相互作用,而第二种方法在紫外线区域进行调节。通过在不进行筛查的情况下将Trion Energy推送到情况下,这两种方法为MOS $ _2 $ layer提供了一致的结果,其Trion Binding Energy $ -49.5(1)$ 〜MEV的激子能量为$ -753.3 $ 〜MEV。我们详细分析了RK和Yamaguchi电位的TRION结构,显示了它们的整体相似性和主要的群集结构,其中强限制的激子与电子弱结合。我们发现,该特性体现在两个Faddeev组件的统治性上,其中孔是相互作用的电子对的观众。
In this work, we develop the basic formalism to study trions in semiconductor layered materials using the Faddeev equations in momentum space for three different particles lying in two dimensions. We solve the trion Faddeev coupled integral equations for both short-range one-term separable Yamaguchi potential and Rytova-Keldysh (RK) interaction applied to the MoS$_2$ layer. We devise two distinct regularization methods to overcome the challenge posed by the repulsive electron-electron RK potential in the numerical solution of the Faddeev equations in momentum space. The first method regulates the repulsive interaction in the infrared region, while the second regulates it in the ultraviolet region. By extrapolating the trion energy to the situation without screening, the two methods gave consistent results for the MoS$_2$ layer with a trion binding energy of $-49.5(1)$~meV for the exciton energy of $-753.3$~meV. We analyzed the trion structure for the RK and Yamaguchi potentials in detail, showing their overall similarities and the dominant cluster structure, where the strongly bound exciton is weakly bound to an electron. We found that this property is manifested in the dominance of two of the Faddeev components over the one where the hole is a spectator of the interacting electron pair.