论文标题
退火参数在二氧化物氧化物纳米晶膜的抗性中的作用
Role of the annealing parameters on the resistance of indium tin oxide nanocrystalline films
论文作者
论文摘要
由于该材料对透明电极，智能窗口和非线性光学元件的重要性，因此对由含量氧化物（ITO）制成的纳米颗粒制成的膜的光学和电性能进行了广泛的研究。在这项工作中，已经执行了对ITO纳米晶膜中的抗性的系统研究，这是对制作后参数的函数（例如退火的温度和时间）。已经证明了与退火参数的电阻可调性，已证明了三个数量级的范围。
The optical and electrical properties of films made of nanoparticles of indium tin oxide (ITO) are widely studied because of the significance of this material for transparent electrodes, smart windows, and nonlinear optics components. In this work, a systematic study of the resistance in ITO nanocrystalline films, as a function of post-fabrication parameters, such as the temperature and time of annealing, has been performed. A tunability of the resistance with the annealing parameters, in a range of three orders of magnitude, has been demonstrated.
