论文标题
库仑耦合的二维层中的等离子阻尼率在异质结构中
Plasmon damping rates in Coulomb-coupled two-dimensional layers in a heterostructure
论文作者
论文摘要
对于双层异质结构，计算了电荷密度振荡的库仑激发。具体而言，我们考虑了基材上二维（2D）层的硅和石墨烯。从获得的表面响应函数中，我们计算了等离子体分散关系，该关系证明了库仑耦合将等离子体频率重新归一致的方式。此外，我们给出了该库仑耦合异质结构中等离子体阻尼速率的新结果，并将这些结果比较，因为层之间的分离是不同的。
The Coulomb excitations of charge density oscillation are calculated for a double-layer heterostructure. Specifically, we consider two-dimensional (2D) layers of silicene and graphene on a substrate. From the obtained surface response function, we calculated the plasmon dispersion relations which demonstrate the way in which the Coulomb coupling renormalizes the plasmon frequencies. Additionally, we present a novel result for the damping rates of the plasmons in this Coulomb coupled heterostructure and compare these results as the separation between layers is varied.
