论文标题

克服可重构纳米结构中的范德华力

Overcoming Van der Waals Forces in reconfigurable nanostructures

论文作者

Zhang, Wang, Wang, Hao, Tan, Alvin T. L., Ranganath, Anupama Sargur, Zhang, Biao, Wang, Hongtao, Chan, John You En, Ruan, Qifeng, Liu, Hailong, Ha, Son Tung, Wang, Dong, Ravikumar, Venkat K., Low, Hong Yee, Yang, Joel K. W.

论文摘要

可重新配置的超材料需要组成纳米结构以证明具有外部刺激的形状。对于通用性,此类纳米结构将在其一种配置之一中触摸并坚持使用其他表面。然而,长期以来的挑战是克服范德华力引起的这种陈述,这阻碍了形状恢复。在这里,我们引入了基于丙烯酸的僵硬但自我恢复的材料系统,并以高射线比结构进行了测试,其中恢复较弱。该设计器材料的储存模量在室温下为〜5.2 GPA,在150摄氏度的橡胶状态下约为90 MPa,比以前的报告高的数量级。基于该聚合物系统开发了用于两光片光刻的高分辨率树脂,从而实现了直径约为400 nm且长宽比高达〜10的纳米柱的3D打印。在实验上,我们观察到自我恢复为崩溃和接触的结构克服了陈述以站起来。我们开发了一个理论模型来解释这些亚微米结构的可恢复性。展示了可重构的结构颜色印刷品和全息图,表明材料系统的潜在应用是适用于亚微米可重新配置超材料的形状存储聚合物。

Reconfigurable metamaterials require constituent nanostructures to demonstrate switching of shapes with external stimuli. For generality, such nanostructures would touch and stick to other surfaces in one of its configurations. Yet, a longstanding challenge is in overcoming this stiction caused by Van der Waals forces, which impedes shape recovery. Here, we introduce a stiff yet self-recovering material system based on acrylic acid, and tested it in high-aspect ratio structures, where recovery is weak. This designer material has a storage modulus of ~5.2 GPa at room temperature and ~90 MPa in the rubbery state at 150 Celsius, an order of magnitude higher than previous reports. A high-resolution resin for two-photon lithography was developed based on this polymer system, enabling 3D printing of nanopillars with diameters of ~400 nm and aspect ratio as high as ~10. Experimentally, we observed self-recovery as collapsed and touching structures overcome stiction to stand back up. We developed a theoretical model to explain the recoverability of these sub-micron structures. Reconfigurable structural colour prints and holograms were demonstrated, indicating potential applications of the material system as a shape memory polymer suitable for sub-micron reconfigurable metamaterials.

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