论文标题
磨损测试期间多孔MOS2涂层的结构重新定位和压实
Structural reorientation and compaction of porous MoS2 coatings during wear testing
论文作者
论文摘要
工业升级通常会导致与文献中介绍的实验室原型不同的涂层微观结构。在这里，我们研究了沉积物理蒸气（PVD）MOS2涂层的磨损行为：致密，纳米晶MOS2涂层，以及多孔的，棱镜纹理的MOS2涂层。磨损测试证据之前和之后的透射电子显微镜（TEM）研究晶体学的重新定位朝向两个样品中的基础纹理。由于其低摩擦特性，通常需要基础纹理。这种有利的重新定位与多孔标本的摩擦学压实有关。跑步后，在高接触压力下滑动最终导致磨损速率与理想种植的散装MOS2单晶所致，该磨损速率通过化学蒸气沉积（CVD）生长的单晶。这表明可以通过合适的预处理来补充工业级MOS2涂层的缺陷。
Industrial upscaling frequently results in a different coating microstructure than the laboratory prototypes presented in the literature. Here, we investigate the wear behavior of physical vapor deposited (PVD) MoS2 coatings: A dense, nanocrystalline MoS2 coating, and a porous, prismatic-textured MoS2 coating. Transmission electron microscopy (TEM) investigations before and after wear testing evidence a crystallographic reorientation towards a basal texture in both samples. A basal texture is usually desirable due to its low-friction properties. This favorable reorientation is associated to a tribological compaction of the porous specimens. Following running-in, sliding under high contact pressure ultimately leads to a wear rate as small as for an ideal grown bulk MoS2 single crystal grown by chemical vapor deposition (CVD). This suggests that the imperfections of industrial grade MoS2 coatings can be remediated by a suitable pretreatment.
