论文标题

拓扑绝缘子和Terahertz频率下的III-V异质结构之间的强耦合

Strong coupling between a topological insulator and a III-V heterostructure at terahertz frequency

论文作者

To, D. Quang, Wang, Zhengtianye, Ho, Q. Dai, Hu, Ruiqi, Acuna, Wilder, Liu, Yongchen, Bryant, Garnett W., Janotti, Anderson, Zide, Joshua M. O., Law, Stephanie, Doty, Matthew F.

论文摘要

从理论上讲,我们在由拓扑绝缘体(TI)和III-V异质结构组成的系统中探测了强耦合的出现,该系统使用基于散射矩阵形式主义的数值方法来探测。具体而言,我们研究了由BI $ _ {2} $ SE $ _ {3} $和GAAS材料组成的结构中Terahertz激发之间的相互作用。我们发现,bi $ _ {2} $ se $ _ {3} $ layer和algaas/gaas量子井与Terahertz频率制度中的ISBBT转换(ISBT)之间的相互作用会创建新的混合模式,即迪拉克Plasmon-Phonon-Phonon-Phonon-isbt Pollitons。这些混合模式的形成导致反杂交(光谱模式分裂),其大小是耦合强度的指示。通过改变组成材料的结构参数,我们的数值计算表明,分裂的幅度在很大程度上取决于掺杂水平和藻类/GAAS量子量井中的散射速率,以及将量子孔结构与Ti层分开的GAAS间隔层的厚度。我们的结果揭示了获得强耦合的实验观察到的签名所需的材料和设备参数。我们的模型包括额外的二维孔气(2DHG)的贡献,该孔(2DHG)预计将以Bi $ _ {2} $ SE $ _ {3} $/GAAS接口,基于密度功能理论(DFT)计算,该计算明确地说明了界面的原子终端的细节。在Ti/III-V界面上存在这种巨大的2DHG的存在使Dirac等离子体ISBT极性子的分散转移到较高的频率上。相比之下,该界面处的阻尼速率补偿了2DHG的效果。最后,我们观察到Ti层中的声子共振对于Ti和III-V材料中THZ激发之间的耦合至关重要。

We probe theoretically the emergence of strong coupling in a system consisting of a topological insulator (TI) and a III-V heterostructure using a numerical approach based on the scattering matrix formalism. Specifically, we investigate the interactions between terahertz excitations in a structure composed of Bi$_{2}$Se$_{3}$ and GaAs materials. We find that the interaction between the Bi$_{2}$Se$_{3}$ layer and AlGaAs/GaAs quantum wells with intersubband transitions (ISBTs) in the terahertz frequency regime creates new hybrid modes, namely Dirac plasmon-phonon-ISBT polaritons. The formation of these hybrid modes results in anti-crossings (spectral mode splitting) whose magnitude is an indication of the strength of the coupling. By varying the structural parameters of the constituent materials, our numerical calculations reveal that the magnitude of splitting depends strongly on the doping level and the scattering rate in the AlGaAs/GaAs quantum wells, as well as on the thickness of the GaAs spacer layer that separates the quantum-well structure from the TI layer. Our results reveal the material and device parameters required to obtain experimentally-observable signatures of strong coupling. Our model includes the contribution of an extra two-dimensional hole gas (2DHG) that is predicted to arise at the Bi$_{2}$Se$_{3}$/GaAs interface, based on density functional theory (DFT) calculations that explicitly account for details of the atomic terminations at the interface. The presence of this massive 2DHG at the TI/III-V interface shifts the dispersion of the Dirac plasmon-ISBT polaritons to higher frequencies. The damping rate at this interface, in contrast, compensates the effect of the 2DHG. Finally, we observe that the phonon resonances in the TI layer are crucial to the coupling between the THz excitations in the TI and III-V materials.

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