论文标题

千分尺尺度单层SNS通过物理蒸气沉积增长

Micrometer-scale monolayer SnS growth by physical vapor deposition

论文作者

Kawamoto, H., Higashitarumizu, N., Nagamura, N., Nakamura, M., Shimamura, K., Ohashi, N., Nagashio, K.

论文摘要

最近,通过简单的物理蒸气沉积(PVD),单层SNS是一种二维基团IV单钙化物,在微米尺寸的云母基板上生长,从而成功地证明了其平面房间温度。但是,单层生长背后的原因尚不清楚,因为人们认为,由于孤对电子引起的较强的层间相互作用,SNS的生长不可避免地会导致多层厚度。在这里,我们研究了来自两个不同的饲料粉末,高度纯化的SNS和商业相处SNS的单层SNS的PVD生长。与期望相反,建议云母底物表面通过从SN2S3污染物中蒸发的硫酸盐来修饰,与高度纯化的粉末相比,与生长相比,与生长相比,由于增强的SNS前体分子的表面扩散,单层SNS的侧向生长得到了促进。该洞察力提供了一个指南,以确定进一步的可控增长条件。

Recently, monolayer SnS, a two-dimensional group IV monochalcogenide, was grown on a mica substrate at the micrometer-size scale by the simple physical vapor deposition (PVD), resulting in the successful demonstration of its in-plane room temperature ferroelectricity. However, the reason behind the monolayer growth remains unclear because it had been considered that the SnS growth inevitably results in a multilayer thickness due to the strong interlayer interaction arising from lone pair electrons. Here, we investigate the PVD growth of monolayer SnS from two different feed powders, highly purified SnS and commercial phase-impure SnS. Contrary to expectations, it is suggested that the mica substrate surface is modified by sulfur evaporated from the Sn2S3 contaminant in the as-purchased powder and the lateral growth of monolayer SnS is facilitated due to the enhanced surface diffusion of SnS precursor molecules, unlike the growth from the highly purified powder. This insight provides a guide to identify further controllable growth conditions.

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