论文标题
低维过渡金属二核苷的波纹诱导的挠性极化与电导率之间的相关性
Correlation between corrugation-induced flexoelectric polarization and conductivity of low-dimensional transition metal dichalcogenides
论文作者
论文摘要
低维过渡金属二分法(TMD)的极性和半导体特性的可调性已将它们推向基本和应用物理研究的最前沿。这些材料可以从非极性到铁电的变化,从直接波段的半导体到金属。但是,除了经典的控制外,例如TMDS中的组成,掺杂和田间效应,由于曲率诱导的电子重新分布以及电子特性的相关变化,因此出现了额外的自由度。在这里,我们通过数值探索弹性和电场,柔性极化和使用有限元建模的波鲁奇的曲线曲线放置在粗糙基板上的TMD纳米片的自由电荷密度。不同的片状厚度和瓦楞纸深度的数值结果使得对平面外电化的挠性性质产生洞察力,并建立了由于不均匀弹性菌株与不均匀的弹性株相连的偏振和静态电导率调节之间的明显相关性,并在TMD Nananoflake中的变形势和较高的变形梯度相连,这些弹性均变化了。我们揭示了将电子和MOTE2纳米瓦器的厚度依赖性以及放置在金属底物上的厚度依赖性的最大值,这为它们的几何形状优化朝着极大改善的极性和电子特性开辟了道路,对于它们在纳米电子和存储设备中的高级应用程序所必需的nanoelectronic和Semportion extories teporation extories tecorment for eforect of by eftery,nNAN的效果。 MOS2,MOTE2和MOSTE纳米片,例如二极管和双极晶体管,具有P-N连接的弯曲锋利性。
Tunability of polar and semiconducting properties of low-dimensional transition metal dichalcogenides (TMDs) have propelled them to the forefront of fundamental and applied physical research. These materials can vary from non-polar to ferroelectric, and from direct-band semiconductor to metallic. However, in addition to classical controls such as composition, doping, and field effect in TMDs the additional degrees of freedom emerge due to the curvature-induced electron redistribution and associated changes in electronic properties. Here we numerically explore the elastic and electric fields, flexoelectric polarization and free charge density for a TMD nanoflake placed on a rough substrate with a sinusoidal profile of the corrugation using finite element modelling. Numerical results for different flake thickness and corrugation depth yield insight into the flexoelectric nature of the out-of-plane electric polarization and establish the unambiguous correlation between the polarization and static conductivity modulation caused by inhomogeneous elastic strains coupled with deformation potential and strain gradients, which evolve in TMD nanoflake due to the adhesion between the flake surface and corrugated substrate. We revealed a pronounced maximum at the thickness dependences of the electron and hole conductivity of MoS2 and MoTe2 nanoflakes placed on a metallic substrate, which opens the way for their geometry optimization towards significant improvement their polar and electronic properties, necessary for their advanced applications in nanoelectronics and memory devices.Specifically, obtained results can be useful for elaboration of nanoscale straintronic devices based on the bended MoS2, MoTe2 and MoSTe nanoflakes, such as diodes and bipolar transistors with a bending-controllable sharpness of p-n junctions.