论文标题
界面组合脉冲激光沉积以增强异质结构的功能特性
Interface combinatorial pulsed laser deposition to enhance heterostructures functional properties
论文作者
论文摘要
在本章中，我们将描述组合脉冲激光沉积（CPLD）的新开发，该开发针对接口库的探索。这个想法是在几个原子层上连续调节界面的组成，以改变其功能特性。由于非常具体的PLD特性，这种独特的界面组合合成是可能的。第一个是其众所周知的复杂氧化物化学计量学从目标转移到膜的能力。第二个是使用原位rheed表征逐层控制原子水平的薄膜生长的层。第三个涉及灌输羽流的方向性，该羽流可以使用移动影掩模在基板上进行选择性区域沉积。但是，PLD也有一些局限性，并且要考虑可靠的CPLD的重要PLD方面。介绍了有关磁性隧道连接中界面磁性控制的多个示例，以及在铁电调节电容器中的能量带和索特基屏障高度调整。
In this chapter we will describe a new development of combinatorial pulsed laser deposition (CPLD) which targets the exploration of interface libraries. The idea is to modulate continuously the composition of interfaces on a few atomic layers in order to alter their functional properties. This unique combinatorial synthesis of interfaces is possible due to very specific PLD characteristics. The first one is its well-known ability for complex oxide stoichiometry transfer from the target to the film. The second one is the layer by layer control of thin film growth at the atomic level using in-situ RHEED characterization. The third one relates to the directionality of the ablated plume which allows for selective area deposition on the substrate using a mobile shadow-mask. However PLD also has some limitations and important PLD aspects to be considered for reliable CPLD are reviewed. Multiple examples regarding the control of interface magnetism in magnetic tunnel junctions and energy band and Schottky barrier height tuning in ferroelectric tunable capacitors are presented.
