论文标题
通过掺杂2D组IV单钙化来调整能屏障
Tuning energy barriers by doping 2D group-IV monochalcogenides
论文作者
论文摘要
结构性变性基于下一代二维材料的铁反对行为,并导致外部田地下奇特的二维结构变换,电荷掺杂和/或温度。这些转换的最直接指标是{\ em弹性能屏障},定义为(退化)结构基态元单元和具有增加结构对称性的晶胞之间的能量差。二维材料与散装底物的接近性会影响发生这些转换的临界场和/或温度的大小,首先是相对电荷转移,这可能触发结构性量子相变。考虑到这种物理情况,我们报告了适度的电荷掺杂($ -0.2 $和$+0.2 $每单位电池的$+0.2 $)对铁弹性黑磷烯的弹性能屏障和9个单一单藻型单层单层的弹性屏障。弹性能屏障$ j_s $是创建$ pnm2_1 \ to p4/nmm $ $二维结构转换所需的能量。与对铁弹性SNO单层的弹性屏障的影响相似,IV组单藻单层单层单层显示出可调的弹性屏障,可用于类似的掺杂量:减少(增加)$ J_S $可以在一个不小于一个孔或一个孔中的较小孔或每个孔中的较少的掺杂量下设计。
Structural degeneracies underpin the ferroic behavior of next-generation two-dimensional materials, and lead to peculiar two-dimensional structural transformations under external fields, charge doping and/or temperature. The most direct indicator of the ease of these transformations is an {\em elastic energy barrier}, defined as the energy difference between the (degenerate) structural ground state unit cell, and a unit cell with an increased structural symmetry. Proximity of a two-dimensional material to a bulk substrate can affect the magnitude of the critical fields and/or temperature at which these transformations occur, with the first effect being a relative charge transfer, which could trigger a structural quantum phase transition. With this physical picture in mind, we report the effect of modest charge doping (within $-0.2$ and $+0.2$ electrons per unit cell) on the elastic energy barrier of ferroelastic black phosphorene and nine ferroelectric monochalcogenide monolayers. The elastic energy barrier $J_s$ is the energy needed to create a $Pnm2_1\to P4/nmm$ two-dimensional structural transformation. Similar to the effect on the elastic energy barrier of ferroelastic SnO monolayers, group-IV monochalcogenide monolayers show a tunable elastic energy barrier for similar amounts of doping: a decrease (increase) of $J_s$ can be engineered under a modest hole (electron) doping of no more than one tenth of an electron or a hole per atom.