论文标题
原位原子力显微镜深度校正后的3维聚焦离子束基于飞行时间的二级离子质谱：空间分辨率，表面粗糙度，氧化
In situ atomic force microscopy depth-corrected 3-dimensional focused ion beam based time-of-flight secondary ion mass spectroscopy: spatial resolution, surface roughness, oxidation
论文作者
论文摘要
原子力显微镜（AFM）是研究表面粗糙度并收集有关样品顶部原子层特征的深度信息的知名工具。通过将二级离子质谱（SIMS）与扫描电子显微镜（SEM）中的聚焦离子束（FIB）结合在一起，可以将溅射结构的化学信息可视化，并以高侧向和深度分辨率位于位置。在本文中，已安装了高真空（HV）AFM，安装在装有飞行时间的二级离子质谱（TOF-SIMS）检测器的Tescan Fib-Sem仪器中。为了研究由TOF-SIMS溅射引起的火山口的深度，随后在多层腔表面发射激光器（VCSEL）样品上进行了随后的AFM测量。表面粗糙度和铣削深度用于有助于溅射体积的化学成分的准确3D重建。分析了可实现的分辨率，溅射过程中的表面粗糙度和表面氧化问题。因此，互补检测器的整合打开了确定样品特性的能力，并了解分析过程中分析方法对样品表面的影响。
Atomic force microscopy (AFM) is a well-known tool for studying surface roughness and to collect depth information about features on the top atomic layer of samples. By combining secondary ion mass spectroscopy (SIMS) with focused ion beam (FIB) milling in a scanning electron microscope (SEM), chemical information of sputtered structures can be visualized and located with high lateral and depth resolution. In this paper, a high vacuum (HV) compatible AFM has been installed in a TESCAN FIB-SEM instrument that was equipped with a time-of-flight secondary ion mass spectroscopy (ToF-SIMS) detector. To investigate the crater's depth caused by the ToF-SIMS sputtering, subsequent AFM measurements were performed on a multilayer vertical cavity surface emitting laser (VCSEL) sample. Surface roughness and milling depth were used to aid accurate 3D reconstruction of the sputtered volume's chemical composition. Achievable resolution, surface roughness during sputtering and surface oxidation issues are analysed. Thus, the integration of complementary detectors opens up the ability to determine the sample properties as well as to understand the influence of the analysis method on the sample surface during the analysis.
